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Controlled Metal Photodeposition
Category(s):
For Information, Contact:
Craig Forney
Commercialization Manager, Chemistry and Materials Sciences
515-294-4740
licensing@iastate.edu
Web Published:
5/5/2015
ISURF #
3956
Summary:
Iowa State University and Ames Laboratory researchers have developed a reliable method for synthesis of semiconductor-metal heterostructures to enable application of materials in catalytic, magnetic, and opto-electronic devices.

Development Stage:
Synthesis of the semi-conductor-metal heterostructures has been accomplished on a laboratory scale, samples are available for testing, and ISU is seeking commercialization partners for this technology.

Description:
Interest in the synthesis of colloidal semiconductor-metal hybrid nanostructures has grown exponentially in recent years. Laser spot irradiation has been reported to have some control over metal deposition; however, this process has low yields and requires expensive equipment.  It also has the potential to change the structure of the metal deposit as a result of the high energy intensity of the laser. Iowa State University and Ames Laboratory researchers have discovered a method that enables illumination of much larger areas at a time and that provides unprecedented control over deposition locale. This could lead to a larger synthetic throughput and wider general availability of finely-structured semiconductor-metal hybrid heterostructures. Initial studies of the process to obtain II.VI semiconductor (cadmium selenium/sulfide) nanorods with active metal (either platinum or palladium) nanoparticles have shown that the heterostructrues become redox-active upon illumination and are capable of mediating photo-induced chemical transformations. The technology results in better, cheaper and more widely available photocatalytic materials for renewable energy and environmental remediation applications.

Advantage:
• Controlled fabrication of colloidal semiconductor-metal hybrid heterostructures
• High yields of site-selective nanoparticles
• Simple, scalable method for metal photodeposition
Application:
Metal photodeposition for catalytic and magnetic materials, as well as opto-electronic devices.

References:
Patent Information:
*To see the full version of the patent(s), follow the link below, then click on "Images" button.
Country Serial No. Patent No. Issued Date
United States 13/733,975 9,834,856* 12/5/2017


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